{"id":1531,"date":"2024-04-08T18:50:48","date_gmt":"2024-04-08T16:50:48","guid":{"rendered":"http:\/\/new.plasmi.eu\/portfolio-articoli\/falcon-rie\/"},"modified":"2026-04-22T11:01:52","modified_gmt":"2026-04-22T09:01:52","slug":"plasma-falcon-rie-plus-reactor-etching-2d-materials","status":"publish","type":"portfolio","link":"https:\/\/www.plasmi.eu\/en\/portfolio-articoli\/plasma-falcon-rie-plus-reactor-etching-2d-materials\/","title":{"rendered":"FALCON RIE+"},"content":{"rendered":"
<\/div><\/section>\n

FALCON RIE+<\/h1>\n

The New Generation Plasma Reactor for 2D Materials<\/h2>\n<\/div><\/section><\/div>
<\/div><\/section><\/p>\n

Advanced Plasma Technology for Research and Industry<\/h3>\n

The FALCON RIE+<\/strong> represents the latest frontier of plasma reactors developed by Gambetti Kenologia. This innovative system is designed to meet the growing needs of modern two-dimensional materials research and sophisticated industrial applications.<\/p>\n

Dual Operating Modes: Maximum Versatility<\/h3>\n

Anisotropic Mode<\/h4>\n
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  • Polarization sample holder<\/strong> for directional attack<\/li>\n
  • Ideal for processes requiring high geometric precision<\/li>\n
  • Optimal control of wall verticality<\/li>\n<\/ul>\n

    Isotropic Mode<\/h4>\n
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    • Upper electrode polarization<\/strong> for uniform attack<\/li>\n
    • Perfect for cleaning and surface activation<\/li>\n
    • Gentle treatments on sensitive materials<\/li>\n<\/ul>\n

      Technical Specifications of Excellence<\/h3>\n

      Trial Chamber<\/h4>\n
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      • Maximum sample diameter<\/strong>: 8 inches<\/li>\n
      • Lower electrode<\/strong>: 200 mm diameter<\/li>\n
      • Vacuum system<\/strong>: High performance turbomolecular pump<\/li>\n
      • Gate valve<\/strong>: 3 positions for optimal pressure control<\/li>\n<\/ul>\n

        Advanced RF Generator<\/h4>\n
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        • Frequency<\/strong>: 13.56 MHz<\/li>\n
        • Power<\/strong>: From <10W up to 200W<\/li>\n
        • Minimum step<\/strong>: 1W for ultra-precise control<\/li>\n
        • Power density<\/strong>: Low W\/cm\u00b2 value for delicate materials<\/li>\n<\/ul>\n

          Complete Gas System<\/h3>\n

          The system supports a full range of process gases:<\/p>\n

            \n
          • N\u2082<\/strong> (Nitrogen): For inert processes and cleaning.<\/li>\n
          • Ar<\/strong> (Argon): Physical sputtering and activation<\/li>\n
          • O\u2082<\/strong> (Oxygen): Organic and ash removal.<\/li>\n
          • SF\u2086<\/strong> (Sulfur hexafluoride): Etching silicon<\/li>\n
          • CF\u2084<\/strong> (Tetrafluoromethane): Etching oxides and nitrides<\/li>\n<\/ul>\n

            Competitive Advantages<\/h3>\n

            Precision Control<\/h4>\n
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            • Linear gas flow<\/strong> from top to bottom<\/li>\n
            • Guaranteed process uniformity<\/strong><\/li>\n
            • Excellent repeatability<\/strong><\/li>\n<\/ul>\n

              Operational Flexibility<\/h4>\n
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              • Quick switching<\/strong> between operating modes<\/li>\n
              • Extended pressure range<\/strong><\/li>\n
              • Adaptability<\/strong> to different applications<\/li>\n<\/ul>\n

                Industrial Reliability<\/h4>\n
                  \n
                • Superior quality components<\/strong><\/li>\n
                • Simplified maintenance<\/strong><\/li>\n
                • Dedicated technical support<\/strong><\/li>\n<\/ul>\n

                  Why Choose FALCON RIE+<\/h3>\n

                  The FALCON RIE+ is not just a plasma reactor, but a complete technological solution<\/strong> for research laboratories and development centers working with:<\/p>\n

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                  • Two-dimensional materials<\/strong> (graphene, MoS\u2082, BN)<\/li>\n
                  • Advanced nanotechnology<\/strong><\/li>\n
                  • Next-generation electronic devices<\/strong><\/li>\n
                  • Innovative photovoltaic applications<\/strong><\/li>\n<\/ul>\n

                    Technical Support and Assistance<\/h3>\n

                    Gambetti Kenologia offers:<\/p>\n

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                    • Turnkey installation<\/strong><\/li>\n
                    • Operator training<\/strong><\/li>\n
                    • Specialized technical assistance<\/strong><\/li>\n
                    • Custom process development<\/strong><\/li>\n<\/ul>\n
                      \n

                      Request Information<\/h3>\n

                      Contact our experts to find out how the FALCON RIE+ can accelerate your research and optimize your production processes.<\/p>\n

                      Gambetti Kenologia<\/strong>\u00a0– Leaders in plasma innovation since 1985.<\/p>\n<\/div><\/section><\/div>\n

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