Oxford Instruments launch the MoS2 growth process

Pubblicata Lun, 4 Luglio 2016

Oxford Instruments launches the MoS2 growth process using the high performance Nanofab® nanoscale growth system.

High quality MoS2 growth extensively characterised & optimised using techniques such as Raman & AFM
  Deposited using CVD from volatile Mo precursors and H2S using the flexible vapour delivery systems
Controlled delivery of solid/liquid precursors ensures process repeatability
  Uniform coverage of layered 2D MoS2 with controlled thickness
  Compatible with delivery of precursors for WS2, MoSe2 and other transition metal dichalogenides (TMDCs)

The MoS2 process is the latest addition to Oxford Instrument's 2D materials process library