News

Oxford Instruments launch the MoS2 growth process

Pubblicata Lun, 4 Luglio 2016

Oxford Instruments launches the MoS2 growth process using the high performance Nanofab^® nanoscale growth system.

• High quality MoS₂ growth extensively characterised & optimised using techniques such as Raman & AFM
•  Deposited using CVD from volatile Mo precursors and H₂S using the flexible vapour delivery systems  
  • Controlled delivery of solid/liquid precursors ensures process repeatability
  • Uniform coverage of layered 2D MoS₂ with controlled thickness
  • Compatible with delivery of precursors for WS₂, MoSe₂ and other transition metal dichalogenides (TMDCs)

The MoS₂ process is the latest addition to Oxford Instrument's 2D materials process library