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News

Workshop alla Cornell University

Pubblicata Ven, 26 Luglio 2013

Latest research and technologies in plasma etch deposition and growth

Venue: Cornell, Ithaca, NY, USA
Date: 20 - 21 August 2013
Businesses Attending: Plasma Technology

Oxford Instruments Plasma Technology & Cornell University will hold a technical seminar addressing

This 1 1/2 day event is on 20th and 21st August, at Cornell University, and will include presentations, discussions, a poster session focussing on latest innovations, and a networking lunch.

Speakers are from key international research institutes, who will discuss their research, and they include:
Prof. Peter Ashburn, Southampton University, UK
Vince Genova, Cornell University

Axel Scherer , Caltech, CA

With more speakers to be announced

In addition, experts in their field from Oxford Instruments & Cornell University will speak on the latest process and applications developments in a number of plasma processing areas.

Presentations currently include:

Presentations currently include:
ALD applications
An overview of Plasma ALD process
MEMS process
Dielectric Etching at the nanoscale
Fine dimension metal and metal compound etching
PECVD & ICP CVD

Information, schedule, and registration:
http://www.cnf.cornell.edu/cnf_2013Oxfordpps.html

This event is free of charge, but registrations must be submitted [online] in advance to facilitate planning. Please register by Monday, August 12th

For any further information please contact: nancy.crouch@oxinst.com