FALCON RIE+:

The New Generation Plasma Reactor for 2D Materials

Advanced Plasma Technology for Research and Industry

The FALCON RIE+ represents the latest frontier of plasma reactors developed by Gambetti Kenologia. This innovative system is designed to meet the growing needs of modern two-dimensional materials research and sophisticated industrial applications.

Dual Operating Modes: Maximum Versatility

Anisotropic Mode

Polarization sample holder for directional attack
Ideal for processes requiring high geometric precision
Optimal control of wall verticality

Isotropic Mode

Upper electrode polarization for uniform attack
Perfect for cleaning and surface activation
Gentle treatments on sensitive materials

Technical Specifications of Excellence

Trial Chamber

Maximum sample diameter: 8 inches
Lower electrode: 200 mm diameter
Vacuum system: High performance turbomolecular pump
Gate valve: 3 positions for optimal pressure control

Advanced RF Generator

Frequency: 13.56 MHz
Power: From <10W up to 200W
Minimum step: 1W for ultra-precise control
Power density: Low W/cm² value for delicate materials

Complete Gas System

The system supports a full range of process gases:

N₂ (Nitrogen): For inert processes and cleaning.
Ar (Argon): Physical sputtering and activation
O₂ (Oxygen): Organic and ash removal.
SF₆ (Sulfur hexafluoride): Etching silicon
CF₄ (Tetrafluoromethane): Etching oxides and nitrides

Competitive Advantages

Precision Control

Linear gas flow from top to bottom
Guaranteed process uniformity
Excellent repeatability

Operational Flexibility

Quick switching between operating modes
Extended pressure range
Adaptability to different applications

Industrial Reliability

Superior quality components
Simplified maintenance
Dedicated technical support

Why Choose FALCON RIE+

The FALCON RIE+ is not just a plasma reactor, but a complete technological solution for research laboratories and development centers working with: