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Plasma etching

It means substrate surface attack, which takes place by means of a reactive process gas.
The reaction produces gases wich are discharged out by the vacuum pump. The surface are becomes also quite wide due to the ionised gas bombardment. Research laboratories and industry are potential users of this technique.

Here are several examples of possible applications:

  • DrStripping of fotoresist
  • Silicon etching
  • Etching and surface modification of fluorinated polymers
  • Metals etching.