Tucano is a bench-top plasma system, designed for surface cleaning, modification and activation. It can operate on different materials such as metals, plastic, ceramic, paper and others.
Tucano consists in a plasma reactor capacitively coupled that comprises a cylindrical process chamber with a couple of planar and parallel electrodes inside, entirely made of aluminum and free of welds. The top electrode is RF biased while the lower electrode is grounded. Thanks to a suitable sample tray, the samples to be processed are manually loaded inside the process chamber
The user friendly graphical interface combined with the efficient RF system makes the Tucano an easy and versatile solution for small productions or R&D environments.
Tucano is fully automated by an advanced PLC with LCD colour touch screen display. The only manual handling to be carried out is the step of loading / unloading of the samples.
With this system it is possible to operate directly on the system components or let the PLC to carry out a process based on a recipe editable by the user.
One or more process gases are introduced into the process chamber by using mass flow controllers (MFCs). An RF signal (13.56 MHz) is led to the electrodes within the chamber; interacting with the gas molecules, this signal, produces the plasma.
The generated plasma provides reactive ionic species that act on the first monolayer of the substrate surface to be treated. The resulting process can be changed by the parameters that affect the state of plasma (gas flows and signal strength).
Product features |
● Bench-top plasma system , easy and versatile |
Specifiche Tecniche | ||
Dimensions | W x L x H – Footprint | 482 x 532 x 385mm |
Net Weight | 34 Kg | |
Clearances | Right, Left, Front – 600 mm, Back – 300 mm | |
Chamber | Material | Aluminum |
Max Volume | 5,9 lt. (360 in³) - Ø 153 mm L 324 mm | |
Electrode |
Electrode Configuration | Plane and parallel With dark shield |
Active work area/Sample tray | 118 mm x 310 mm | |
Electrode gap | 68 mm | |
Material | Alluminio | |
RF Signal | Maw output Power | 200W |
Frequency | 13,56 MHz | |
Process Gases | Available flows | 5, 10, 20, 50, 100 sccm |
Max gases number | 2 (Mass Flow Controller from MKS Instruments) | |
Control Interface | Control | PLC |
User Interface | Touch screen Display |
|
Facility Service | Power supply | Single phase + Earth 220/240 VAC, 8 Amax 50/60 Hz, 13 AWG Single phase + Earth 110/120 VAC, 16 Amax, 50/60 Hz, 10 AWG |
Process Gas inlets, type and dimensions | 6 mm OD, Compression Fittings | |
Process gas pressure | From 1 bar min. to 1,5 bar max., regulated | |
Purge Gas inlets, type and dimensions | 6 mm OD, Compression Fittings | |
Suggested Purge Gas | N2, Air | |
Purge Gas Pressure | From 0.8 bar min. to 1 bar max., regulated | |
Exhaust | NW16 ISO-KF | |
Compliance | International | CE Marked |
Consult the scientific articles published by using our plasma reactors |