Pubblicata Mer, 15 Marzo 2017
We are delighted to announce that Oxford Instruments Plasma Technology has received the High Volume Manufacturing Award at the annual CS Industry Awards held on 7 March 2017 in Brussels.
The award highlights the company's development of the SiC via plasma etch process, using the company's own tool, the PlasmaPro100 Polaris system.
SiC is becoming an increasingly important material, particularly for high performance GaN RF devices using SiC as a substrate. A smooth via etch through the SiC is essential to the functioning of these devices.
Capabilities of Oxford Instruments' SiC via process include
Other features include
NEW TUCANO XL - Plasma RIE
Mon, 18 May 2020
EMRS 2020 Spring meeting
Mon, 10 February 2020
ISPC24 24th International Sympsium on Plasma Chemistry
Wed, 6 February 2019
PlasmaPro100 Polaris wins industry award!
Wed, 15 March 2017
NEW table top plasma Colibrì 2016
Fri, 18 November 2016
NEW table top plasma Tucano 2016
Sun, 6 November 2016
Oxford Instruments launch the MoS2 growth process
Mon, 4 July 2016
GraphITA 2015
Fri, 24 April 2015
Oxford Instruments Plasma Technology :: Workshop on dry processing for Nanoelectronics and Micromechanics: Deposition & etching
Sun, 19 April 2015
GGK-CS14 Manually controls our automatic matching network with RF power supplies from other manufacturers
Tue, 18 February 2014
19th International Vacuum Congress IVC-19 - September 9-13
Thu, 4 July 2013
New website online
Wed, 3 July 2013